SOFT-X-RAY MULTILAYER GRATINGS WITH SUBHALFMICRON PERIOD

Soft-x-ray multilayer gratings with a subhalfmicron period (360 nm) are produced using uv holography and reactive ion etching. The multilayers are fabricated by a triode sputtering technique. The diffraction patterns of these new optical devices are measured at the Cu Lα, β wavelength (1.33 nm). The results are discussed within the framework of a scalar diffraction theory of relief gratings. © 1990.