GROWTH AND CHARACTERISTICS OF GALN ASP-INP DOUBLE HETEROSTRUCTURE LASERS

被引:12
作者
GREENE, PD
HENSHALL, GD
机构
来源
IEE JOURNAL ON SOLID-STATE AND ELECTRON DEVICES | 1979年 / 3卷 / 06期
关键词
Compilation and indexing terms; Copyright 2025 Elsevier Inc;
D O I
10.1049/ij-ssed.1979.0035
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A horizontal furnace system has been developed for growth by liquid-phase epitaxy of multilayer laser structures consisting of InP and (Ga, In) (As, P) incorporating a number of novel features. Double heterostructure lasers emitting at 1. 3 mu m with threshold current densities as low 900 A/cm**2 have been made. Measurements of the far-field beam angles have allowed the dielectric constant step between the active quaternary and passive layers for lasers emitting at both 1. 15 mu m and 1. 3 mu m, to be deduced. Oxide-insulated stripe-geometry c. w. lasers, operating in a single logitudinal mode, have been made with threshold currents down to 180 mA.
引用
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页码:174 / 178
页数:5
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