GROWTH IN A RESTRICTED-CURVATURE MODEL

The surface structure of a restricted-curvature model is studied. If evaporation and deposition are allowed equally the surface width W increases as t(beta) with beta = 0.365 +/- 0.01 (d = 1 + 1) and beta = 0.24 +/- 0.01 (d = 2 + 1) being consistent with the results of a fourth-order linear equation which describes growth under surface diffusion. In the nonequilibrium situation. the average velocity of the surface height decreases exponentially with time and the surface becomes frozen in the long-time limit. Near this nonequilibrium pinning transition, the crossover length diverges as a power law in the deviation from equilibrium.