ACTINIDE TARGET PREPARATION BY FOCUSED ION-BEAM SPUTTERING

被引：9

作者：

KWINTA, J

机构：

[1] C.E.A., Centre d'Études de Bruyères le Chatel, 92542 Montrouge Cedex

来源：

NUCLEAR INSTRUMENTS & METHODS | 1979年 / 167卷 / 01期

关键词：

D O I：

10.1016/0029-554X(79)90478-6

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Two focused ion beam sputtering units are used in our laboratory for preparing actinide targets. Both are mounted in glove boxes. One apparatus is used for low specific activities, i.e. Th and U isotopes and the other for high specific activities, i.e. Pu and trans-Pu isotopes. Operating conditions and results concerning angular distributions, deposition rates and carbon backing breaking strengths are given for metals, oxides or other chemical forms of actinide deposits. Some phenomena, such as composition change of uranium oxide during deposition, sensitivity of metallic plutonium deposition rate with respect to its oxygen content and simultaneous vapour deposition of a high vapour pressure compound such as uranium fluoride are shown. © 1979.

引用

页码：65 / 70

页数：6