PHOTOEMISSION FROM CLEAN AND OXYGEN-COVERED ULTRAFINE NICKEL PARTICLES

被引：18

作者：

MULLER, U

AMMANN, M

BURTSCHER, H

SCHMIDTOTT, A

机构：

[1] Laboratorium für Festkörperphysik, Eidgenössische Technische Hochschule

来源：

PHYSICAL REVIEW B | 1991年 / 44卷 / 15期

关键词：

D O I：

10.1103/PhysRevB.44.8284

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Ultrafine nickel particles are produced in ultrapure helium. The measured photothreshold and photoelectric yield of clean nickel particles are found to be in fairly good agreement with theoretical calculations based on a three-step model using density-of-states data of a flat surface. The photothreshold change due to oxygen adsorption on nickel particles was measured. It shows qualitatively the same behavior as on a flat surface but with a sticking coefficient that is smaller by a factor of 500 compared with the one on a flat Ni(110) surface. The formation of NiO is found to influence the experiment at high surface coverage.

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页码：8284 / 8287

页数：4

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