GAS-DYNAMICS AND FILM PROFILES IN PULSED-LASER DEPOSITION OF MATERIALS

被引：284

作者：

ANISIMOV, SI

BAUERLE, D

LUKYANCHUK, BS

机构：

[1] JOHANNES KEPLER UNIV,A-4040 LINZ,AUSTRIA

[2] RUSSIAN ACAD SCI,INST GEN PHYS,MOSCOW 117942,RUSSIA

来源：

PHYSICAL REVIEW B | 1993年 / 48卷 / 16期

关键词：

D O I：

10.1103/PhysRevB.48.12076

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Film-thickness profiles obtained in pulsed-laser deposition are calculated by using the well-known solution of the gas-dynamic equations which describes the expansion of the plasma plume in vacuum. The time for plasma formation is supposed to be short compared with the time of expansion. The film profile depends on the initial dimensions of the plume and on the adiabatic exponent of the vapor.

引用

页码：12076 / 12081

页数：6

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