PHOTOLITHOGRAPHIC CONTACT PRINTING OF 4000A LINEWIDTH PATTERNS

被引：38

作者：

SMITH, HI ^{[1
]}

EFREMOW, N ^{[1
]}

KELLEY, PL ^{[1
]}

机构：

[1] MIT, LINCOLN LAB, LEXINGTON, MA 02173 USA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1974年 / 121卷 / 11期

关键词：

D O I：

10.1149/1.2401719

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：1503 / 1506

页数：4

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