A NEW SYSTEM FOR VACUUM DEPOSITION OF REFRACTORY MATERIALS USING AN ATMOSPHERIC-PRESSURE INDUCTIVELY COUPLED PLASMA

被引：9

作者：

MERKLE, BD

KNISELEY, RN

SCHMIDT, FA

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 03期

关键词：

D O I：

10.1063/1.339859

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1017 / 1021

页数：5

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