EPITAXY AT LOW-TEMPERATURES BY VAPOR-DEPOSITION OF PD, PT, RH, AND IR OBSERVED BY FIELD-ION MICROSCOPY

被引：17

作者：

GRAHAM, WR

REED, DA

HUTCHINS.F

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1972年 / 43卷 / 07期

关键词：

D O I：

10.1063/1.1661638

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：2951 / +

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