PREPARATION OF TITANIUM NITRIDE BY A PULSED DC MAGNETRON REACTIVE DEPOSITION TECHNIQUE USING THE MOVING MODE OF DEPOSITION

被引：61

作者：

ARONSON, AJ

CHEN, D

CLASS, WH

机构：

来源：

关键词：

Compendex;

D O I：

10.1016/0040-6090(80)90544-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Titanium compounds

引用

页码：535 / 540

页数：6

相关论文

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[3] MICROSTRUCTURES OF TIN AND TI2N DEPOSITS PREPARED BY ACTIVATED REACTIVE EVAPORATION
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BUNSHAH, RF
[J]. THIN SOLID FILMS, 1979, 63 (02) : 333 - 339
[4] PERNY G, 1966, VIDE, V106