THE GROWTH OF ANODIC OXIDE FILMS ON GERMANIUM

被引：22

作者：

ZWERDLING, S

SHEFF, S

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1960年 / 107卷 / 04期

关键词：

D O I：

10.1149/1.2427690

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：338 / 342

页数：5

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[1] ANODIC POLARIZATION OF ZIRCONIUM AT LOW POTENTIALS - FORMATION RATES, FORMATION FIELD, ELECTROLYTIC PARAMETERS, AND FILM THICKNESSES OF VERY THIN OXIDE FILMS
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[5] THE KINETICS AND MECHANISM OF FORMATION OF ANODE FILMS ON SINGLE-CRYSTAL INSB
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[7] ANODIC OXIDATION OF ALUMINUM, CHROMIUM, HAFNIUM, NIOBIUM, TANTALUM, TITANIUM, VANADIUM, AND ZIRCONIUM AT VERY LOW CURRENT DENSITIES
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[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1957, 104 (06) : 339 - 346
[8] INFRARED ABSORPTION AND OXYGEN CONTENT IN SILICON AND GERMANIUM
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[9] THE ANODIC OXIDATION OF CADMIUM .1. MECHANISM OF FILM FORMATION
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[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1958, 105 (01) : 52 - 57
[10] THE ADSORPTION OF GASES ON A GERMANIUM SURFACE
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[J]. JOURNAL OF PHYSICAL CHEMISTRY, 1955, 59 (06) : 543 - 549