BEAM PROPERTIES OF ALGAAS POWER LASERS WITH HIGH-QUALITY ETCHED MIRRORS

被引:13
作者
BONA, GL
BUCHMANN, P
CLAUBERG, R
JAECKEL, H
VETTIGER, P
VOEGELI, O
WEBB, DJ
机构
[1] Zurich Research Laboratory, IBM Research Division, Switzerland
关键词
9;
D O I
10.1109/68.93862
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
High-quality etched mirrors for AlGaAs/GaAs power lasers for applications in optical storage have been fabricated by chemically assisted ion-beam etching. In order to ensure flat mirror facets of the ridge-waveguide lasers, a flared-waveguide end section is employed. This results in a very slight mirror roughness of approximately 20 nm across the beam cross section, and yields excellent beam properties allowing diffraction-limited focusing up to 50 mW output power.
引用
收藏
页码:412 / 414
页数:3
相关论文
共 9 条
[1]  
BORN M, 1980, PRINCIPLES OPTICS, pCH9
[2]  
BUCHMANN P, 1988, MICROCIRCUIT ENG, V9, P485
[3]  
HAYES J, 1983, P SPIE, V429
[4]  
JAECKEL H, 1991, IN PRESS IEEE J QUAN, V27
[5]   BIDIRECTIONAL BEAM PROPAGATION METHOD [J].
KACZMARSKI, P ;
LAGASSE, PE .
ELECTRONICS LETTERS, 1988, 24 (11) :675-676
[6]   LARGE AREA ION-BEAM ASSISTED ETCHING OF GAAS WITH HIGH ETCH RATES AND CONTROLLED ANISOTROPY [J].
LINCOLN, GA ;
GEIS, MW ;
PANG, S ;
EFREMOW, NN .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :1043-1046
[7]  
VETTIGER P, 1991, IN PRESS IEEE J QUAN, V27
[8]  
Welford W.T., 1974, ABERRATIONS SYMMETRI
[9]  
1990, Patent No. 402556