A NEW BATH FOR THE ELECTRODEPOSITION OF ALUMINUM .3. THE ELECTROCHEMICAL-BEHAVIOR OF THE ROTATING ALUMINUM DISK ELECTRODE IN PURE ALCL3/THF-TOLUENE SOLUTIONS

被引：1

作者：

BADAWY, WA

SABRAH, BA

机构：

[1] UNIV CAIRO,FAC SCI,DEPT CHEM,CAIRO,EGYPT

[2] CAIRO UNIV,FAC EDUC,DEPT CHEM & PHYS,FAYOUM,EGYPT

来源：

关键词：

D O I：

10.1007/BF01009267

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：220 / 224

页数：5

共 27 条

[1] ANTROPOV LI, 1972, THEORETICAL ELECTROC, pCH14
[2] COMPOSITION OF MIXED HYDRIDE REAGENTS . A STUDY OF SCHLESINGER REACTION
ASHBY, EC
PRATHER, J
[J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1966, 88 (04) : 729 - &
[3] BADAWY MW, 1980, THESIS TH C SCHLORLE
[4] A NEW BATH FOR THE ELECTRODEPOSITION OF ALUMINUM .1. CONDUCTIVITY MEASUREMENTS
BADAWY, WA
SABRAH, BA
HILAL, NHY
[J]. JOURNAL OF APPLIED ELECTROCHEMISTRY, 1986, 16 (05) : 707 - 711
[5] BADAWY WA, 1986, INDIAN J TECHNOL, V24, P118
[6] A NEW BATH FOR THE ELECTRODEPOSITION OF ALUMINUM .2. KINETICS AND MECHANISM OF THE DEPOSITION AND DISSOLUTION PROCESSES
BADAWY, WA
SABRAH, BA
HILAL, NHY
[J]. JOURNAL OF APPLIED ELECTROCHEMISTRY, 1987, 17 (02) : 357 - 369
[7] BARD AJ, 1980, ELECTROCHEMICAL METH, pCH8
[8] BEACH JG, 1968, PLATING, V55, P936
[9] BERCAW TR, 1956, J AM CHEM SOC, V78, P1841
[10] CLAY FA, 1969, PLATING, V56, P1027