THE STRUCTURAL CHARACTERIZATION OF DC SPUTTERED INSITU YBA2CU3O7-X THIN-FILMS

被引:5
作者
GUILLOUXVIRY, M [1 ]
KARKUT, MG [1 ]
PERRIN, A [1 ]
SERGENT, M [1 ]
机构
[1] CTR NATL ETUD TELECOMMUN,CTR LANNION B,DIV OCM,F-22301 LANNION,FRANCE
关键词
D O I
10.1016/0167-577X(90)90045-N
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We use θ-2θ X-ray diffractometry, Weissenberg photography, and scanning electron microscopy (SEM) to structurally characterize YBa2Cu3O7-x thin films deposited in situ by dc sputtering on substrates of (100) MgO and (100) SrTiO3. The films undergo a clear structural evolution - from powder-like, to mixed a- and c-axis, and finally to c-axis orientation - as the substrate temperature is increased. For optimal sputtering conditions (Tc0= 85-87 K) the films are structurally ordered both perpendicular and parallel to the substrate surface as revealed by Weissenberg photography. SEM images taken of films grown on both MgO and SrTiO3 reinforce the in-plane structural order of the films. © 1990.
引用
收藏
页码:126 / 132
页数:7
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