DEPOLARIZATION FIELD AND STABILITY CONSIDERATIONS IN THIN FERROELECTRIC FILMS

被引:39
作者
BATRA, IP [1 ]
WURFEL, P [1 ]
SILVERMA.BD [1 ]
机构
[1] IBM CORP,RES LAB,SAN JOSE,CA 95193
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1973年 / 10卷 / 05期
关键词
D O I
10.1116/1.1318414
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:687 / 692
页数:6
相关论文
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