NOVEL BEAMLINE OPTICS FOR X-RAY-LITHOGRAPHY

被引：6

作者：

COLE, RK

CERRINA, F

机构：

[1] Center for X-ray Lithography, University of Wisconsin - Madison, Stoughton, WI 53589

来源：

MICROELECTRONIC ENGINEERING | 1991年 / 13卷 / 1-4期

关键词：

D O I：

10.1016/0167-9317(91)90097-W

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We describe here a unique lithography beamline that delivers x-rays using a flexible arrangement of two toroidal mirrors (one concave-concave and the other concave-convex), providing high spectral and spatial uniformity at the wafer plane. The image produced is a thin horizontal line, suitable for exposing a 25 by 50 mm field compatible with 0.25-mu-m VLSI. We also present the current status of the beamline being constructed at CXrL utilizing these optics.

引用

页码：295 / 298

页数：4

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