CALCULATION OF DEPOSITION UNIFORMITY IN RF SPUTTERING

被引：11

作者：

BRODIE, I

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1969年 / 6卷 / 05期

关键词：

D O I：

10.1116/1.1492710

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Desposition uniformities in RF sputtering was calculated for several device geometries including the '%'peak'%' configuration of adacent retangular targets, the disk type, and coaxial cylinder targets and substrate holders. Areas over which deposition uniformities are predicted to be plus or minus 1 to 10% were computed and the results compared with experiments.

引用

页码：795 / &

共 9 条

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