ADHESION AND REMOVAL OF PARTICULATE CONTAMINANTS IN A HIGH-DECIBEL ACOUSTIC FIELD

被引：15

作者：

MONTZ, KW ^{[1
]}

BEDDOW, JK ^{[1
]}

BUTLER, PB ^{[1
]}

机构：

[1] UNIV IOWA,DEPT MECH ENGN,IOWA CITY,IA 52240

来源：

POWDER TECHNOLOGY | 1988年 / 55卷 / 02期

基金：

美国国家科学基金会;

关键词：

IMAGE PROCESSING - Image Analysis - INTEGRATED CIRCUIT MANUFACTURE - Contamination;

D O I：

10.1016/0032-5910(88)80096-2

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

An experimental investigation was conducted to study the interaction of a high-decibel acoustic field with micron-sized particulate matter adhered to a glass slide. The experimental design utilized an acoustic field in order to overcome adhesion forces acting on the contaminant materials. An image analysis technique determined foreign particle counts before and after the cleansing process. Removal efficiencies were calculated for sound pressure levels (SPLs) between 155 and 165 dB. For the materials tested, removal rates were unpredictable and generally poor at SPL less than 160 dB. However, removal rates in excess of 90% were observed at SPL equals 165 dB. Experimental results for several different materials show that the relative adhesion and removal forces are a function of particulate material and substrate properties.

引用

页码：133 / 140

页数：8

共 18 条

[1]

BARDINA J, 1988, J PARTIC SCI TECHNOL, V6

[2] AN ANALYSIS OF PARTICLE ADHESION ON SEMICONDUCTOR SURFACES [J].

BOWLING, RA .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (09) :2208-2214

[3] ELECTROSTATIC CONTRIBUTION TO POWDER-PARTICLE ADHESION [J].

DONALD, DK .

JOURNAL OF APPLIED PHYSICS, 1969, 40 (07) :3013-&

[4]

DUFFALO JM, 1984, SOLID STATE TECHNOL, V27, P109

[5]

Hinds W. C., 1982, AEROSOL TECHNOLOGY P, V1st ed.

[6]

KHILNANI A, 1956, MICROCONTAMINATION, V4, P4

[7]

Kinsler L. E., 2000, FUNDAMENTALS ACOUSTI, V4th ed.

[8]

KRUPP H, 1967, ADV COLLOID INTERFAC, V1, P113

[9]

Mednikov E.P., 1965, APPL MECH MAT, V34, P1087

[10]

MITTAL KL, 1979, SURFACE CONTAMINATIO, V2

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