CALIBRATION AND CHARACTERIZATION OF A PULSED SOFT-X-RAY SOURCE

被引:10
作者
PETERS, DW [1 ]
DARDZINSKI, BJ [1 ]
KELLY, DR [1 ]
机构
[1] HAMPSHIRE INSTRUMENTS INC,MARLBOROUGH,MA 01752
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1990年 / 8卷 / 06期
关键词
D O I
10.1116/1.585128
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Typical x-ray flux measurement methods (diodes, thermopiles, sensitized photographic film, photoresist, etc.) yield questionable accuracy and poor precision. A commercially available nylon-based radiochromic film, developed for monitoring dose during radiation processing of food products, was used to calibrate and characterize a high brightness (10(6)-10(7) W/srad), pulsed, laser plasma, soft x-ray source. The response of this film can be calibrated using NIST radiation standards, has negligible x-ray wavelength and environmental dependence, and is doserate insensitive over a large range. The change in optical density (DELTA-OD) of exposed film is directly proportional to the incident dose. Excellent agreement was observed for film response to both broadband soft x rays (0.6-lesser-than-or-equal-to-lambda-lesser-than-or-equal-to-2.2 nm) and 20 keV electrons. An incident dose of 100 mJ/cm2 resulted in a DELTA-OD of 1.00 with a measurement precision of +/- 2%, with no evidence of saturation found up to 120 mJ/cm2. The laser plasma source demonstrated flux stability of better than 5% over a five-month period. Dosimetry film was also used to measure illumination uniformity, measure soft x-ray transmission through various materials, and calibrate an on-board miniature x-ray diode for dose integration.
引用
收藏
页码:1624 / 1627
页数:4
相关论文
共 12 条
[1]   PHOTOMETRIC PAPERS SENSITIVE ONLY TO SHORT WAVE ULTRAVIOLET [J].
CHALKLEY, L .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1952, 42 (06) :387-392
[2]  
FRANKEL RD, 1986, P KODAK MICROELECTRO, P82
[3]  
HENKE BL, 1982, AT DATA NUCL DATA TA, V27
[4]   DOSIMETRY AND QUALITY-CONTROL IN ELECTRON-BEAM PROCESSING [J].
HUMPHERYS, KC ;
KANTZ, AD .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1979, 26 (01) :1784-1789
[5]   RADIACHROMIC - RADIATION MONITORING-SYSTEM [J].
HUMPHERYS, KC ;
KANTZ, AD .
RADIATION PHYSICS AND CHEMISTRY, 1977, 9 (4-6) :737-747
[6]  
LINGNAU J, 1989, SOLID STATE TECHNOL, V32, P105
[7]  
MCLAUGHLIN WL, 1967, T AM NUCL SOC, V10, P52
[8]  
Oertel H., 1989, Proceedings of the SPIE - The International Society for Optical Engineering, V1089, P283, DOI 10.1117/12.968537
[9]  
Peters D. W., 1989, Microelectronic Manufacturing and Testing, V12, P57
[10]  
Peters D. W., 1990, Proceedings of the SPIE - The International Society for Optical Engineering, V1263, P99, DOI 10.1117/12.20149