COMPUTATIONAL STUDIES ON THE SHAPE AND CONTROL OF PLASMAS IN MAGNETRON SPUTTERING SYSTEMS

被引：32

作者：

IDO, S

NAKAMURA, K

机构：

[1] Department of Functional Material Science and Technology, Saitama University, Urawa, Saitama, 338

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1993年 / 32卷 / 12A期

关键词：

MAGNETRON SPUTTERING; PLASMA; EROSION; ELECTRON ORBIT; COLLISION; RUNGE-KUTTA-GILL; MONTE-CARLO METHOD;

D O I：

10.1143/JJAP.32.5698

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The three-dimensional motions of electrons are traced in magnetron sputtering systems. Electrons are emitted from a cathode and show drift motion. Collisions between electrons and neutral gas atoms of Ar are examined using the Monte Carlo method. The distribution of ionization points is used to show the shape of plasmas. The results of the simulations are as follows. The profiles of plasma distribution correspond to the shape of the magnetic field. The shape of erosion profile caused by sputtering agrees well with the plasma profile. The increase of ionization points is obtained by increasing the neutral gas pressure.

引用

页码：5698 / 5702

页数：5

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