A MATHEMATICAL-MODEL FOR A PLASMA-ASSISTED DOWNSTREAM ETCHING REACTOR

被引：19

作者：

PARK, SK ^{[1
]}

ECONOMOU, DJ ^{[1
]}

机构：

[1] UNIV HOUSTON,DEPT CHEM ENGN,HOUSTON,TX 77004

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 07期

关键词：

D O I：

10.1063/1.344118

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3256 / 3267

页数：12

共 44 条

[1] SODIUM CONTAMINATION IN SIO2-FILMS INDUCED BY PLASMA ASHING [J].

AKIYA, H ;

SAITO, K ;

KOBAYASHI, K .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (03) :647-655

[2] EFFECTS OF GEOMETRY ON DIFFUSION-CONTROLLED CHEMICAL-REACTION RATES IN A PLASMA [J].

BATTEY, JF .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (03) :437-441

[3]

Bell A. T., 1974, Techniques and applications of plasma chemistry, P1

[4]

Brake M. L., 1983, Plasma Chemistry and Plasma Processing, V3, P79, DOI 10.1007/BF00566029

[5] STREAMLINE UPWIND PETROV-GALERKIN FORMULATIONS FOR CONVECTION DOMINATED FLOWS WITH PARTICULAR EMPHASIS ON THE INCOMPRESSIBLE NAVIER-STOKES EQUATIONS [J].

BROOKS, AN ;

HUGHES, TJR .

COMPUTER METHODS IN APPLIED MECHANICS AND ENGINEERING, 1982, 32 (1-3) :199-259

[6]

CHERRINGTON BE, 1979, GASEOUS ELECTRONICS

[7] APPLICATION OF ELECTRON-PARAMAGNETIC-RES SPECTROSCOPY TO OXIDATIVE REMOVAL OF ORGANIC MATERIALS [J].

COOK, JM ;

BENSON, BW .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (12) :2459-2464

[8] CONTINUOUS FLOW SYSTEMS - DISTRIBUTION OF RESIDENCE TIMES [J].

DANCKWERTS, PV .

CHEMICAL ENGINEERING SCIENCE, 1953, 2 (01) :1-13

[9]

DETTMER JW, 1978, THESIS AIR FORCE I T

[10] DECAPSULATION AND PHOTORESIST STRIPPING IN OXYGEN MICROWAVE PLASMAS [J].

DZIOBA, S ;

ESTE, G ;

NAGUIB, HM .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (11) :2537-2541

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