DEFECTS IN VAPOUR-GROWN SILICON LAYERS

被引:6
作者
BATSFORD, KO
THOMAS, DJD
机构
关键词
D O I
10.1016/0038-1101(62)90116-8
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:353 / 354
页数:2
相关论文
共 7 条
[1]   DEPTH OF SURFACE DAMAGE DUE TO ABRASION ON GERMANIUM [J].
BUCK, TM ;
MCKIM, FS .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1956, 103 (11) :593-597
[2]   COPPER PRECIPITATION ON DISLOCATIONS IN SILICON [J].
DASH, WC .
JOURNAL OF APPLIED PHYSICS, 1956, 27 (10) :1193-1195
[3]  
LIGHT TB, 1961, UNPUB P AIME M LOS A
[4]   A METALLOGRAPHIC INVESTIGATION OF THE DAMAGED LAYER IN ABRADED GERMANIUM SURFACES [J].
PUGH, EN ;
SAMUELS, LE .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1961, 108 (11) :1043-1047
[5]   STACKING FAULTS IN EPITAXIAL SILICON [J].
QUEISSER, HJ ;
FINCH, RH ;
WASHBURN, J .
JOURNAL OF APPLIED PHYSICS, 1962, 33 (04) :1536-&
[6]  
QUEISSER HJ, 1961, J APPL PHYS, V32, P1176
[7]  
THOMAS D, UNPUB