PATTERNED METAL ELECTRODEPOSITION USING AN ALKANETHIOLATE MASK

被引：44

作者：

MOFFAT, TP

YANG, H

机构：

[1] Materials Science and Engineering Laboratory, National Institute of Standards and Technology, Gaithersburg

[2] NIST Guest Researcher from IGEN, Inc., Gaithersburg

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1995年 / 142卷 / 11期

关键词：

D O I：

10.1149/1.2048452

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Alkanethiolate films were used as templates for patterned electrodeposition of metal structures with micrometer dimensions. Two patterning schemes were implemented, contact printing of a C16H33SH film and mechanical scribing micrometer wide grooves in a self-assembled C16H33SH monolayer film. A thin film of nickel was then electrodeposited on film-free areas of the copper and gold substrates. The alkanethiolate template can also be used as a mask for chemical etching. This was demonstrated by etching C16H33SH patterned copper substrates. More complex structures can be built by combining both deposition and etching processes.

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页码：L220 / L222

页数：3

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