ELECTRON-BEAM HEATING TEMPERATURE PROFILES IN MODERATELY THICK COLD STAGE STEM-SEM SPECIMENS

被引：23

作者：

TALMON, Y

THOMAS, EL

机构：

[1] Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, Minnesota

来源：

JOURNAL OF MICROSCOPY-OXFORD | 1978年 / 113卷 / MAY期

关键词：

D O I：

10.1111/j.1365-2818.1978.tb00095.x

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

The analytic solution for the model of electron beam heating a moderately thick STEM/SEM specimen was used to calculate the steady state temperature profiles developed in the bulk of the specimen. For thin specimens one maximum in the temperature profile was found near the surface. The location of this maximum shifted away from the surface with increasing sample thickness. For specimens of thickness approaching the electron range two maxima were found: one close to the surface (as in thin samples) due to a ‘self‐insulating’ effect, and another maximum near the sample‐substrate interface—a result of very rapid increase in the energy loss by the electrons near their penetration range. These results are of particular interest for X‐ray microanalysis where high beam currents are used, resulting in potentially large temperature rises in the bulk of the specimen. 1978 Blackwell Science Ltd

引用

页码：69 / 75

页数：7

共 6 条

[1] PREDICTION OF X-RAY PRODUCTION AND ELECTRON SCATTERING IN ELECTRON-PROBE ANALYSIS USING A TRANSPORT EQUATION [J].

BROWN, DB .

JOURNAL OF APPLIED PHYSICS, 1969, 40 (04) :1627-+

[2] MULTIPLE SCATTERING OF 5-30 KEV ELECTRONS IN EVAPORATED METAL FILMS .2. RANGE-ENERGY RELATIONS [J].

COSSLETT, VE ;

THOMAS, RN .

BRITISH JOURNAL OF APPLIED PHYSICS, 1964, 15 (11) :1283-&

[3]

REUTER E, 1974, SCANNING ELECTRON MI, P44

[4] BEAM HEATING OF A MODERATELY THICK COLD STAGE SPECIMEN IN SEM-STEM [J].

TALMON, Y ;

THOMAS, EL .

JOURNAL OF MICROSCOPY, 1977, 111 (NOV) :151-164

[5]

TALMON Y, 1977, SCANNING ELECTRON MI, V1, P347

[6]

Whiddington R, 1912, P R SOC LOND A-CONTA, V86, P360, DOI 10.1098/rspa.1912.0028

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