GROWTH OF DIAMOND BY ATOMIC VAPOR-DEPOSITION

被引：5

作者：

KOIZUMI, S

INUZUKA, T

SAWABE, A

SUZUKI, K

机构：

[1] TOSHIBA CO LTD,CTR RES & DEV,SAIWAI KU,KAWASAKI 210,JAPAN

[2] KYOEI PLAST CO,CHICHIBU,SAITAMA 368,JAPAN

来源：

关键词：

D O I：

10.1016/S0022-0248(08)80105-4

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

[No abstract available]

引用

页码：1188 / 1191

页数：4

共 5 条

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[2] FUJIMOTO F, 1968, J PHYS SOC JPN, V15, P1022
[3] KOIZUMI S, 1988, 49TH AUT M JAP SOC A, P442
[4] VAPOR-DEPOSITION OF DIAMOND PARTICLES FROM METHANE
MATSUMOTO, S
SATO, Y
KAMO, M
SETAKA, N
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1982, 21 (04): : L183 - L185
[5] CHARACTERIZATIONS OF THE DC DISCHARGE PLASMA DURING CHEMICAL VAPOR-DEPOSITION FOR DIAMOND GROWTH
SUZUKI, K
SAWABE, A
INUZUKA, T
[J]. APPLIED PHYSICS LETTERS, 1988, 53 (19) : 1818 - 1819