TIARA ELECTROSTATIC ACCELERATORS FOR MULTIPLE ION-BEAM APPLICATION

被引：42

作者：

SAITOH, Y ^{[1
]}

TAJIMA, S ^{[1
]}

TAKADA, I ^{[1
]}

MIZUHASHI, K ^{[1
]}

UNO, S ^{[1
]}

OHKOSHI, K ^{[1
]}

ISHII, Y ^{[1
]}

KAMIYA, T ^{[1
]}

YOTUMOTO, K ^{[1
]}

TANAKA, R ^{[1
]}

IWAMOTO, E ^{[1
]}

机构：

[1] NISSIN HIGH VOLTAGE CO,MAEBASHI,GUNMA 371,JAPAN

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1994年 / 89卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(94)95138-1

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A unique electrostatic accelerators facility has been constructed mainly for application of multiple beam and microbeam to materials science research at JAERI Takasaki. The facility consists of a 3 MV single-ended accelerator with an extremely high voltage-stability of +/- 1 x 10(-5), a 3 MV tandem accelerator and a 0.4 MV ion implanter, which cover various ion particles in an energy range of 10 keV to 20 MeV. A voltage ripple of +/- 1 X 10(-5) (60 V(pp)) at 3 MV has been achieved for the single-ended machine. The performance of accelerators, beam lines and their applications to various research activities are outlined.

引用

页码：23 / 26

页数：4