NEW PRECURSORS FOR WIDE-GAP-II-VI SEMICONDUCTORS

被引:11
作者
JONES, AC
机构
[1] Epichem Ltd., Wirral
关键词
D O I
10.1088/0268-1242/6/9A/007
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Recent advances in the growth of wide-gap II-VI semiconductors by MOVPE have been greatly facilitated by the development of new precursor materials. For instance, the use of adducts such as Me2ZnNEt3 and Me2Zn (triazine)2 has served to eliminate a formerly severe pre-reaction during the growth of ZnSe and ZnS and has allowed the growth of high-quality layers at low to moderate temperatures. The use of adducts has also been extended to the growth of cadmium-based II-VI alloys. The bis-tetrahydrothiophene adduct of Me2Cd has been used as a precursor to CdS and CdSe. However, in this case, pre-reaction with the group VI hydride is only slightly inhibited. From a consideration of possible reaction mechanisms we have developed a novel technique for the in situ control of gas-phase premature reactions.
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页码:A36 / A40
页数:5
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