EFFECTS OF ABSORBED ARGON ON ELECTRICAL PROPERTIES OF THIN COPPER FILMS

被引:11
作者
WILSON, GW
SINHA, BP
机构
关键词
D O I
10.1016/0040-6090(71)90109-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:207 / &
相关论文
共 7 条
[1]  
COUTTS TJ, 1968, BR J APPL PHYS, V1, P1071
[2]   EFFECTS OF NITROGEN METHANE + OXYGEN ON STRUCTURE + ELECTRICAL PROPERTIES OF THIN TANTALUM FILMS [J].
GERSTENBERG, D ;
CALBICK, CJ .
JOURNAL OF APPLIED PHYSICS, 1964, 35 (02) :402-&
[3]  
KUZMENKO PP, 1963, SOV PHYS-SOL STATE, V4, P1783
[4]   INFLUENCE OF INERT GAS DURING DEPOSITION ON PROPERTIES OF EVAPORATED CHROMIUM FILMS [J].
LU, CS ;
MILGRAM, AA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1967, 4 (01) :49-&
[5]   ELECTRICAL-RESISTIVITY MODEL FOR POLYCRYSTALLINE FILMS - CASE OF ARBITRARY REFLECTION AT EXTERNAL SURFACES [J].
MAYADAS, AF ;
SHATZKES, M .
PHYSICAL REVIEW B, 1970, 1 (04) :1382-&
[6]   THE MEAN FREE PATH OF ELECTRONS IN METALS [J].
SONDHEIMER, EH .
ADVANCES IN PHYSICS, 1952, 1 (01) :1-42
[7]   Over the Course of the Reaction at the Transition of pure Metal Layers from the disordered to the ordered State [J].
Suhrmann, R. ;
Schnackenberg, H. .
ZEITSCHRIFT FUR PHYSIK, 1942, 119 (5-6) :287-317