THE CREATION OF METASTABLE DEFECTS IN A-SI-H FILMS BY HIGH-DOSE IRRADIATION WITH KEV-ELECTRONS

被引：19

作者：

SCHNEIDER, U ^{[1
]}

SCHRODER, B ^{[1
]}

FINGER, F ^{[1
]}

机构：

[1] UNIV MARBURG,FACHBEREICH PHYS,D-3550 MARBURG,FED REP GER

来源：

关键词：

D O I：

10.1016/0022-3093(87)90190-6

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：795 / 798

页数：4

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