TEMPERATURE-COEFFICIENT OF RESISTANCE OF THIN MANGANESE FILMS

被引：21

作者：

SHIVAPRASAD, SM

ANGADI, MA

UDACHAN, LA

机构：

来源：

关键词：

D O I：

10.1016/0040-6090(80)90170-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：L1 / L4

页数：4

共 11 条

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[3]

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[4]

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[5]

HOLLAND L, 1961, VACUUM DEPOSITION TH

[6] TEMPERATURE COEFFICIENT OF RESISTANCE IN THIN VANADIUM FILMS [J].

JAIN, SC ;

CHANDER, R .

[7]

LARSON D, 1971, PHYS THIN FILMS, V6, P94

[8]

Maissel L.I., 1970, HDB THIN FILM TECHNO

[9]

NEUGEBAUER C, 1964, PHYS THIN FILMS, V2, P23

[10]

SHIVAPRASAD SM, UNPUBLISHED