ENGINEERING OF PLASMA DEPOSITION SYSTEMS USED FOR PRODUCING LARGE AREA A-SI-H DEVICES

被引：11

作者：

MARTINS, R

FERREIRA, I

CARVALHO, N

GUIMARAES, L

机构：

[1] Faculty of Science and Technology, New University of Lisbon, Department of Materials Science, 2825 Monte da Caparica, Quinta da Torre

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1991年 / 137卷

关键词：

D O I：

10.1016/S0022-3093(05)80231-5

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

One of the main problems in producing large area amorphous silicon devices concerns films uniformity. In this paper we present data concerning the role of reactor geometry and design and on the film performances as well as the problems related to mechanical mismatches in scaling up the reactor size.

引用

页码：757 / 760

页数：4