ULTRA-HIGH VACUUM .2. LIMITING FACTORS ON THE ATTAINMENT OF VERY LOW PRESSURE

被引：101

作者：

ALPERT, D

BURITZ, RS

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1954年 / 25卷 / 02期

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D O I：

10.1063/1.1721603

中图分类号：

O59 [应用物理学];

学科分类号：

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页码：202 / 209

页数：8

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共 15 条

[1] NEW DEVELOPMENTS IN THE PRODUCTION AND MEASUREMENT OF ULTRA HIGH VACUUM
ALPERT, D
[J]. JOURNAL OF APPLIED PHYSICS, 1953, 24 (07) : 860 - 876
[2] VACUUM VALVE FOR THE HANDLING OF VERY PURE GASES
ALPERT, D
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1951, 22 (07) : 536 - 537
[3] SURFACE PHENOMENA USEFUL IN VACUUM TECHNIQUE
APKER, LR
[J]. INDUSTRIAL AND ENGINEERING CHEMISTRY, 1948, 40 (05): : 846 - 847
[4] EXTENSION OF THE LOW PRESSURE RANGE OF THE IONIZATION GAUGE
BAYARD, RT
ALPERT, D
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1950, 21 (06) : 571 - 572
[5] DUSHMAN S, 1921, PHYS REV, V15, P7
[6] DUSHMAN S, 1949, SCI F VACUUM TECHNIQ, P730
[7] HOLSTEIN T, R94411D WEST RES REP
[8] THE PHYSICAL BASIS OF THE RESIDUAL VACUUM CHARACTERISTIC OF A THERMIONIC VALVE
METSON, GH
[J]. BRITISH JOURNAL OF APPLIED PHYSICS, 1951, 2 (FEB): : 46 - 48
[9] STUDY OF EFFECT OF CATION CONCENTRATION AND SIZE ON HELIUM PERMEABILITY OF ALKALI-SILICA GLASSES
NEWKIRK, TF
TOOLEY, FV
[J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1949, 32 (09) : 272 - 278
[10] HELIUM DIFFUSION THROUGH GLASS
NORTON, FJ
[J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1953, 36 (03) : 90 - 96