BORONIZATION IN DIII-D

被引:81
作者
JACKSON, GL
WINTER, J
BURRELL, KH
DEBOO, JC
GREENFIELD, CM
GROEBNER, RJ
HODAPP, T
HOLTROP, K
KELLMAN, AG
LEE, R
LIPPMANN, SI
MOYER, R
PHILLIPS, J
TAYLOR, TS
WATKINS, J
WEST, WP
机构
[1] General Atomics, San Diego, CA 92186-9784
关键词
D O I
10.1016/S0022-3115(06)80038-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A thin boron film has been applied to the DIII-D tokamak plasma facing surfaces to reduce impurity influx, particularly oxygen and carbon. A direct result of this surface modification was the observation of a regime of very high energy confinement, VH-mode, with confinement times from 1.5 to 2 times greater than predicted by the H-mode scaling relation for the same set of parameters. VH-mode discharges are characterized by low ohmic target densities, low edge neutral pressure, and reduced recycling. These conditions have reduced the collisionality nu* in the edge region producing a higher edge pressure gradient and a significant bootstrap current, up to 30% of the total current. We will describe the edge plasma properties after boronization including reductions in recycling inferred from measurements of tau(p)*. In particular we will discuss the edge plasma conditions necessary for access to VH-mode including the boronization process and properties of the deposited film.
引用
收藏
页码:236 / 240
页数:5
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