EFFECT OF LA3+ IONS ON THE DEPOSITION OF NICKEL-OXIDE

被引：13

作者：

MATSUMOTO, Y

SASAKI, T

HOMBO, J

机构：

[1] Department of Applied Chemistry, Faculty of Engineering, Kumamoto University, Kumamoto, 860

来源：

ELECTROCHIMICA ACTA | 1993年 / 38卷 / 08期

关键词：

ADSORPTION OF LANTHANUM ION; DEPOSITION OF NICKELOXIDE; ELECTROCHEMICAL SYNTHESIS; NIOOH; PEROVSKITE;

D O I：

10.1016/0013-4686(93)80225-O

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The effect of La3+ ions on the deposition of nickel oxide (NiOOH) in solutions containing both La3+ and Ni2+ ions was studied. La3+ ions suppressed a growth of NiOOH by their incorporation into the deposit in the deposition process. The rate of La3+ incorporation is low, compared with that of the NiOOH deposition. The limiting value in the atomic ratio of La/Ni in the deposit was about 1-2 when NiOOH was deposited under a low deposition rate.

引用

页码：1145 / 1146

页数：2

共 9 条

[1] ELECTRODEPOSITION OF NICKEL AND COBALT OXIDES ONTO PLATINUM AND GRAPHITE-ELECTRODES FOR ALKALINE WATER ELECTROLYSIS [J].