EFFECTS OF OXIDE ISOLATION ON PROPAGATION DELAY IN INTEGRATED INJECTION LOGIC (I2L)

被引:3
作者
IIZUKA, T [1 ]
机构
[1] TOKYO SHIBAURA ELECT CO LTD,TOSHIBA RES & DEV CTR,KAWASAKI,KANAGAWA 210,JAPAN
关键词
D O I
10.1109/JSSC.1977.1050953
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:547 / 552
页数:6
相关论文
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