THE PROPERTIES AND EXPOSURE CHEMISTRY OF A SOLUBLE POLYDIACETYLENE (P4BCMU) USED AS A NEGATIVE ELECTRON-BEAM RESIST

被引:14
作者
COLTON, RJ
MARRIAN, CRK
SNOW, A
DILELLA, D
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 05期
关键词
D O I
10.1116/1.583614
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
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页码:1353 / 1359
页数:7
相关论文
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