CHEMICAL BONDING EFFECTS IN OXYGEN KALPHA X-RAY-EMISSION BANDS OF SILICA

被引：51

作者：

GILBERT, TL

STEVENS, WJ

SCHRENK, H

YOSHIMINE, M

BAGUS, PS

机构：

[1] ARGONNE NATL LAB, ARGONNE, IL 60439 USA

[2] IBM CORP, RES LAB, SAN JOSE, CA 95114 USA

来源：

PHYSICAL REVIEW B | 1973年 / 8卷 / 12期

关键词：

D O I：

10.1103/PhysRevB.8.5977

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：5977 / 5998

页数：22

共 73 条

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