THE INTERACTION OF OXYGEN WITH CLEAN SILICON SURFACES

被引：53

作者：

LAW, JT

机构：

来源：

JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS | 1958年 / 4卷 / 1-2期

关键词：

D O I：

10.1016/0022-3697(58)90198-7

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：91 / 100

页数：10

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