MODELING THE ELEMENTARY STEPS OF LOW-PRESSURE DIAMOND DEPOSITION

被引:7
作者
BIENER, J
SCHUBERT, UA
SCHENK, A
WINTER, B
LUTTERLOH, C
KUPPERS, J
机构
[1] Max-Planck-Institut Für Plasmaphysik, Euratom-Association Boltzmannstrasse 2, Garching, D-85748
关键词
D O I
10.1002/adma.19930050909
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Low-pressure diamond deposition from hydrocarbon/hydrogen ps-phase mixtures was discovered over 20 years ago, but the exact deposition mechanism remained unknown. Work reported here confirms preferential graphite erosion to be the rate-controlling step, as had been assumed by some researchers earlier, and identifies reaction pathways by which the graphitic constituents of the deposit are preferentially removed. Model systems of C:H a few monolayers thick were used to show that dehydrogenation, erosion, and hydrogenation all play a part.
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页码:639 / 643
页数:5
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