LOW DEFECT DENSITY AMORPHOUS HYDROGENATED SILICON PREPARED BY HOMOGENEOUS CHEMICAL VAPOR-DEPOSITION

被引:65
作者
SCOTT, BA
REIMER, JA
PLECENIK, RM
SIMONYI, EE
REUTER, W
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D O I
10.1063/1.92972
中图分类号
O59 [应用物理学];
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页码:973 / 975
页数:3
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