OXIDATION OF NIOBIUM IN THE TEMPERATURE RANGE 350-DEGREES-C-750-DEGREES-C

被引：27

作者：

AYLMORE, DW

GREGG, SJ

JEPSON, WB

机构：

来源：

关键词：

D O I：

10.1149/1.2427731

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：495 / 501

页数：7

共 22 条

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[7] THE MICROTOPOGRAPHY OF OXIDE FILMS ON NIOBIUM
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CAMPBELL, JJ
SMITH, GP
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1958, 105 (08) : 442 - 446
[8] FINCH GI, 1951, P ROYAL SOC A, V239, P145
[9] ON THE MECHANISM OF OXIDE FILM FORMATION ON ZIRCONIUM
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VARLEY, JHO
[J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1958, 6 (2-3) : 213 - 222
[10] GOLDSCHMIDT HJ, 1958, J I MET, V87, P235