HEAT-TRANSFER THROUGH THE MELT IN A SILICON CZOCHRALSKI PROCESS

被引:15
作者
KOBAYASHI, S
机构
[1] Advanced Technology Laboratories, Sumitomo Metal Industries, Ltd., Amagasaki, 660, No. 3, I-chome, Nishinagasu Hondori
关键词
D O I
10.1016/S0022-0248(08)80008-5
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Most of the thermal models for CZ crystal growth are based on the assumption of conduction dominance, neglecting convective heat transfer in the melt. The effects of convective heat transfer in the Si melt are studied in terms of two extreme models: an axially symmetric laminar flow model and a k-e model of turbulence. The results are compared with those of a conduction dominated thermal model. Heat transfer through the melt is convection dominated for a production scale puller with radius 0.2 m, while the conduction dominated thermal model is valid for a laboratory scale melt with radius 0.075 m. © 1990, Elsevier Science Publishers B.V.. All rights reserved.
引用
收藏
页码:692 / 695
页数:4
相关论文
共 9 条
[1]  
DIKOFF JAM, 1960, SOLID STATE ELECTRON, V1, P202
[2]   DIRECT OBSERVATION BY X-RAY RADIOGRAPHY OF CONVECTION OF MOLTEN SILICON IN THE CZOCHRALSKI GROWTH METHOD [J].
KAKIMOTO, K ;
EGUCHI, M ;
WATANABE, H ;
HIBIYA, T .
JOURNAL OF CRYSTAL GROWTH, 1988, 88 (03) :365-370
[3]  
KOBAYASHI N, 1982, J CRYST GROWTH, V43, P357
[5]   DIGITAL-SIMULATION OF FLOW PATTERNS IN CZOCHRALSKI CRYSTAL-PULLING PROCESS [J].
LANGLOIS, WE ;
SHIR, CC .
COMPUTER METHODS IN APPLIED MECHANICS AND ENGINEERING, 1977, 12 (02) :145-152
[6]  
Launder B. E., 1972, MATH MODELS TURBULEN
[7]  
ROSSI FD, 1959, RCA REV, V19, P349
[8]   SILICON-WAFERS FOR THE 1990-S [J].
SEIDEL, TE .
JOURNAL OF CRYSTAL GROWTH, 1987, 85 (1-2) :97-105
[9]  
THOMPSON JF, 1985, NUMERICAL GRID GENER, P307