FACTS AND FICTION ABOUT PULSE PLATING

This paper illustrates some of the basic principles of pulse plating and examines the effect of pulsed current on the current density distribution, limiting current density, rate of deposition and power consumption. Some specific examples of the effect of pulsed current on various deposit properties have been considered. Emphasis has been placed on what may be expected to be achieved in practical situations and the practical limitations of the pulse plating process have been discussed in terms of maximum practical frequency and minimum practical duty cycle.