THIN-FILM OXIDATION AND LOGARITHMIC RATE LAW

被引：14

作者：

CHATTOPADHYAY, B ^{[1
]}

机构：

[1] SIR JOHN CASS SCH SCI & TECHNOL, DEPT MET MAT, LOND E1 7PF, ENGLAND

来源：

关键词：

D O I：

10.1016/0040-6090(73)90161-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：117 / 124

页数：8

共 38 条

BARDEEN, J .

PHYSICAL REVIEW, 1947, 71 (10) :717-727

[2]

BRATTAIN WH, 1953, AT&T TECH J, V32, P1

[3]

BRATTAIN WH, 1960, SURFACE CHEMISTRY ME

[4] THEORY OF THE OXIDATION OF METALS [J].

CABRERA, N ;

MOTT, NF .

CHATTOPADHYAY, B .

[6]

CHATTOPADHYAY B, 1969, J MATER SCI, V4, P456

[7]

CHATTOPADHYAY B, 1967, THESIS LONDON U

[8]

CHATTOPADHYAY B, 1968, 28 SOC CHEM IND LOND, P463

[9] THE OXIDATION OF IRON AT 175-DEGREES-C TO 350-DEGREES-C [J].

DAVIES, DE ;

EVANS, UR ;

AGAR, JN .

PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1954, 225 (1163) :443-462

[10]

Evans U.R., 1960, EDWARD ARNOLD, DOI DOI 10.1002/MACO.19780290130