LOW-TEMPERATURE GROWTH OF THE INFINITE LAYER PHASE OF SRCUO2 BY PULSED LASER DEPOSITION

被引:21
作者
NIU, C
LIEBER, CM
机构
[1] HARVARD UNIV,DEPT CHEM,CAMBRIDGE,MA 02138
[2] HARVARD UNIV,DIV APPL SCI,CAMBRIDGE,MA 02138
关键词
D O I
10.1021/ja00035a070
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
引用
收藏
页码:3570 / 3571
页数:2
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