APPLICATION OF A HIGHER RPA TO A MODEL PI-ELECTRON SYSTEM

被引：69

作者：

SHIBUYA, TI

MCKOY, V

机构：

来源：

JOURNAL OF CHEMICAL PHYSICS | 1970年 / 53卷 / 08期

关键词：

D O I：

10.1063/1.1674482

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

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页码：3308 / &

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