SELECTIVE ELECTROLESS METAL DEPOSITION USING PATTERNED PHOTO-OXIDATION OF SN(II) SENSITIZED SUBSTRATES

被引：35

作者：

DAMICO, JF

DEANGELO, MA

HENRICKSON, JF

KENNEY, JT

SHARP, DJ

机构：

来源：

关键词：

D O I：

10.1149/1.2407814

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1695 / +

页数：1

共 14 条

[1]

COHEN R, IN PRESS

[2]

DAMICO JF, TO BE PUBLISHED

[3]

GOLDIE W, 1968, METALLIC COATING PLA, V1

[4]

GOLDIE W, 1968, METALLIC COATING PLA, V1, pCH5

[5]

KENNEY JT, TO BE PUBLISHED

[6]

LANDO DJ, TO BE PUBLISHED

[7] NUCLEATION GROWTH AND STRUCTURE OF THIN NI-P FILMS [J].

MARTON, JP ;

SCHLESINGER, M .

[8] NUCLEATION, GROWTH, AND STRUCTURE OF ELECTROLESS COPPER DEPOSITS [J].

SARD, R .

[9]

SAUBESTRE EB, 1962, METAL FINISHING, V60

[10]

SEWALL P, 1969, THESIS LEHIGH U