DISPERSION OF THE REFRACTIVE-INDEX AND CHEMICAL COMPOSITION OF SIOX FILMS

被引：6

作者：

ZUTHER, G

HUBNER, K

ROGMANN, E

机构：

[1] Sektion Physik, Wilhelm-Pieck-Universität Rostock

来源：

THIN SOLID FILMS | 1979年 / 61卷 / 03期

关键词：

D O I：

10.1016/0040-6090(79)90485-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The dispersion of the refractive index of amorphous silicon oxide (SiOx) as a function of the chemical composition (x in the range 0-2) is described on the basis of Wemple's single-oscillator model. It is shown that the variation of the refractive index with the chemical composition is primarily dependent on the relative numbers of SiSi and SiO bonds. A new method is proposed for the determination of the chemical composition of SiOx. It involves a precise measurement of the dispersion of the refractive index and comparison of these results with the slopes of theoretical Sellmeier plots. © 1979.

引用

页码：391 / 395

页数：5

共 11 条

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[2]

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[3]

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[4]

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[5]

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[6]

Haas, Salzberg, Optical Properties of Silicon Monoxide in the Wavelength Region from 024 to 140 Microns, Journal of the Optical Society of America, 44, (1954)

[7]

Jungk, Phys. Status Solidi A, 34, (1977)

[8]

Hubner, Chemical bond and related properties of SiO2 VI. electronic structure of SiOx, Physica Status Solidi (a), 52, (1979)

[9]

Pantelides, Phys. Rev. Lett., 35, (1975)

[10]

Pantelides, Harrison, Phys. Rev. B, 13, (1976)

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