INTERACTION OF SI2H6 WITH A SI(111)-7X7 SURFACE

被引：112

作者：

IMBIHL, R ^{[1
]}

DEMUTH, JE ^{[1
]}

GATES, SM ^{[1
]}

SCOTT, BA ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

PHYSICAL REVIEW B | 1989年 / 39卷 / 08期

关键词：

D O I：

10.1103/PhysRevB.39.5222

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：5222 / 5233

页数：12

相关论文

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