ARF LASER-INDUCED EMISSION FROM HIGH-TC SUPERCONDUCTING (123) THIN-FILMS DEPOSITED BY ARF LASER ABLATION

被引:7
作者
DESHMUKH, S
ROTHE, EW
RECK, GP
KUSHIDA, T
XU, ZG
机构
[1] WAYNE STATE UNIV,DEPT CHEM,DETROIT,MI 48202
[2] WAYNE STATE UNIV,INST MFG RES,DETROIT,MI 48202
关键词
D O I
10.1088/0953-2048/1/6/009
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:319 / 323
页数:5
相关论文
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